色婷婷精品国产一区二区三区-国产又大又粗又长-99热最新网址-aaa视频-欧美激情自拍-在线h片-国产人妖在线-国产精品爽爽爽-国产黄在线-www.日韩视频-欧美成人免费网站-中文成人无字幕乱码精品区-欧美激情在线看-黄瓜视频色版-日韩av在线播放观看-亚洲春色在线-91大神视频在线播放-精品久久毛片-97无码精品人妻-91激情视频在线-免费h在线观看-看国产黄色片-久草视频2-有码日韩-好吊一二三-永久精品网站-亚洲网中文字幕-国产精品网站入口-女同做爰猛烈叫-很狠撸

neiyebanner2
Substrate EPD testing machine
Home / Visual Inspection of Semiconductor /

Substrate EPD testing machine

Substrate EPD testing machine

The shape and distribution of dislocation defects in semiconductor wafer preparation have a significant impact on the performance of electronic components. Due to differences in doping materials and preparation processes, the distribution of dislocations also varies. This device is used to inspect the morphology and distribution of wafer dislocations, providing data support for wafer material research and improving preparation processes. Suitable for 2-inch, 3-inch, 4-inch, and 6-inch gallium arsenide substrates.

Project

Performance index

Testing items

Detect whether there are dislocation defects on the substrate through machine vision inspection technology and count the dislocation defects

Dislocation characteristics: diamond shaped with long and short axis dislocations, black hexagonal dislocations, etc

Card control requirements

5000 dislocations/cm2, which means that the field of view per square centimeter requires less than 5000 dislocations, and more than 5000 dislocations are considered abnormal

Counting method:

(1) Whole piece imaging: comprehensively image the entire substrate, and then calculate the number of dislocations point by point;

(2) 69 point imaging: Use a camera to image 69 1 millimeter long and wide points, calculate the number of dislocations, and then calculate the average and maximum single point values;

Dislocation identification

The dislocation features are diamond shaped with long and short axes or dark black similar to hexagons, and those without such features are not included in the count; In addition, dislocations of similar size are counted. When detecting large area dislocations, a key pop-up prompt will appear.

Optical accuracy

1um/Pixel

Counting error

≤± 3% (excluding sampling error)

As the sample size increases, the counting error will gradually decrease

Detection speed

4-inch substrate 69 o'clock time: 50 seconds

4-inch substrate whole piece time: 10 minutes

 

 

Message Board
If you are interested in our products and want to know more details, please leave a message here and we will reply to you as soon as possible
Related Products
Wafer thickness measuring instrument

This device measures the thickness of wafers and display panels after partial processes such as wafer slicing, grinding, thinning, and slicing. Can synchronously test the TTVBOWWRAP/SORI and other parameter errors of the material itself.

View More
Wafer scratch AOI inspection machine

The wafer scratch AOI inspection machine is mainly used for detecting obvious scratch defects such as missed scratches, defocusing, uncut, and bicrystals on the core grains on the Disco ring after wafer splitting machine processing. Through Machine Vision defect detection, the presence or absence of the above defects can be detected to distinguish between good and defective products, reduce manual labor, and improve detection efficiency.

View More
Wire/Die Bonding AOI inspection machine

Solid state wire bonding AOI inspection machine, also known as wire bonding AOI inspection machine, is mainly used for efficient AOI inspection of defects after die bonding and wire bonding in the semiconductor packaging and testing field. It has the characteristics of high speed, high precision, and high inspection coverage. Optical system modules and core detection algorithms with completely independent intellectual property rights, as well as AI deep learning algorithms, are suitable for detecting various defects on grain surfaces, solder joints, solder wires, and frame surfaces that occur during the solidification and wire bonding processes.

View More
Substrate EPD testing machine

The shape and distribution of dislocation defects in semiconductor wafer preparation have a significant impact on the performance of electronic components. Due to differences in doping materials and preparation processes, the distribution of dislocations also varies. This device is used to inspect the morphology and distribution of wafer dislocations, providing data support for wafer material research and improving preparation processes. Suitable for 2-inch, 3-inch, 4-inch, and 6-inch gallium arsenide substrates.

View More
Top

Message Board

Message Board
If you are interested in our products and want to know more details, please leave a message here and we will reply to you as soon as possible
Submit

Home

Products

whatsApp